Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography

The development of environmentally friendly materials and processes is a major issue that concerns all industrial sectors, including microelectronics. aim this study to demonstrate the possibility using chitosan-based photoresists for microelectronic applications on silicon by 193 nm photolithography. photopatterning chitosan films demonstrated analyzed different spectroscopy microscopy techniques. In particular, it shown irradiation allows one induce chain breaks modify solubility in an aqueous developing solution, without denaturing macromolecule chains. This mechanism obtain patterns, these patterns can be transferred physical etching into silica. It also formulated resins are compatible with spin-coating exposure tools, which opens very interesting perspectives positive context.